New York Governor Kathy Hochul announced that the first major components of ASML’s next-generation chipmaking system have arrived at the Albany NanoTech Complex, beginning installation at North America’s first accessible High-NA EUV chip research center.
According to the governor’s office, the shipment included the system’s bottom main module and marks the next stage in establishing a shared High-NA EUV lithography center at the NY Creates facility. The project is backed by a $1 billion state investment and is expected to draw about $9 billion in industry funding while creating hundreds of permanent jobs.
Additional components are due to arrive throughout the summer as installation continues through 2026, with initial development milestones expected by year-end and research and development work scheduled to begin in early 2027.
Advanced tool targets smaller chip designs
ASML’s advanced chipmaking system is roughly the size of a small house, weighs more than 200 tonnes, and uses highly precise light and optics to help manufacturers produce faster, more energy-efficient chips.
Once assembled at NY Creates’ NanoFab Reflection facility, the equipment will be available to industry and academic partners working on chip patterning, process development and device scaling.
The center is expected to support research on semiconductor technologies below the one-nanometer level, although commercial production using such processes would still require further development and manufacturing investment.
Shared access strengthens Albany’s chip research base
The arrival follows the earlier delivery of a Tokyo Electron system that will operate alongside the ASML tool, supporting a broader effort to establish Albany as a shared semiconductor research hub for companies and universities.
NY Creates said the facility will give industry and academic partners shared access to High-NA EUV equipment for advanced chip patterning, process development and device-scaling research.
“As we continue building North America’s first accessible High NA EUV Lithography Center, we are catalyzing a cutting-edge ecosystem where industry and academic partners can accelerate the breakthroughs that will define the next generation of semiconductor innovation for years to come, underpinning American leadership in the technologies of tomorrow,” NY Creates President and CEO Dave Anderson said.
New York ties state backing to industry expansion
New York officials have tied the project to wider semiconductor investments across the state, including manufacturing and research activity involving Micron, GlobalFoundries and IBM.
The state expects the Albany center to support workforce development as well as technical research, although the long-term economic effect will depend on how many companies use the facility and whether research projects lead to commercial production.
ASML shares extend six-month rally
For ASML, the shipment brings its High-NA EUV technology, which plays a key role in printing smaller and more complex chip features, into a shared U.S. research environment and gives researchers access to equipment expected to support future chipmaking processes.
The announcement coincided with a 4.77% rise in ASML’s Amsterdam-listed shares, which closed Tuesday at €1,593.40 after reaching an intraday high of €1,596.40.
The gain extended ASML’s six-month rise to roughly 40%, with the stock climbing from about €1,140 in January to €1,593.40 on Tuesday.
ASML’s year-to-date advance had reached about 70% by July 20, supported by strong demand for the company’s equipment used to manufacture advanced chips for artificial intelligence applications.
